Nanofabrication and Nanolithography

Nanofabrication and Nanolithography

Nanofabrication and nanolithography are critical technologies that enable the manipulation of materials at the nanoscale, facilitating the development of novel devices and systems with enhanced properties and functionalities. Nanofabrication encompasses a range of techniques used to construct structures and devices at dimensions typically between 1 and 100 nano meters. This precision allows for the creation of intricate patterns and architectures that can significantly improve the performance of electronic, optical, and biomedical applications. One of the most prominent methods in nanofabrication is lithography, which involves transferring patterns onto a substrate using various techniques.. However, as devices continue to shrink, challenges arise in achieving the required resolution. This has led to the development of advanced lithographic techniques, such as electron-beam lithography (EBL) and nanoimprint lithography (NIL). EBL utilizes focused beams of electrons to create patterns with extremely high resolution, allowing for the fabrication of complex nanostructures. On the other hand, NIL employs a mould to imprint nanoscale features onto a material, enabling high-throughput production while maintaining precision. Nanofabrication also includes techniques such as chemical vapour deposition (CVD) and molecular beam epitaxy (MBE), which are used to grow thin films and nanostructures with controlled composition and properties. These methods are essential for creating materials with specific electrical, optical, or mechanical characteristics, often necessary for applications in nano electronics, photonics, and energy storage. The applications of nanofabrication and nanolithography are vast and transformative. In the biomedical field, nanofabrication enables the development of targeted drug delivery systems, diagnostic tools, and tissue engineering scaffolds that can mimic biological environments. By enabling precise control over material properties and device architectures, these techniques ultimately contributing to the development of next-generation technologies that address complex global challenges.

Related Sessions:

Committee Members

Prof. Dr.-Ing
Frank Muecklich

Saarland University, Germany

Professor
Paulo Cesar De Morais

Catholic University of Brasilia, Brazil

Professor
Thomas J. Webster

Hebei University of Technology, China

Professor Emeritus
Vladimir G. Chigrinov

Hong Kong University of Science and Technology, Hong Kong

M-Nano 2025 Speakers

Professor Emeritus
Osman Adiguzel

Firat University, Turkey

Senior Scientist
Oleg Dimitriev

V.Lashkaryov Institute of Semiconductor Physics, Ukraine

Chief Scientific Officer
Mitra Mosharraf

HTD Biosystems, United States

Postdoctoral Researcher
Meiyan Gao

University of California, United States

Tags

Copyright 2024 Mathews International LLC All Rights Reserved

Watsapp
Top